ALPIS-3

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Company Name:DNF Co., Ltd.
Membership:Free Member
Member Since:2006. 04.13
Country/Region:Korea
City:Daejeon
Contact:Yong-hwan Na
Related Keywords:CVD, ALD, Al PRECURSOR, PRECURSOR

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DNF Co., Ltd.
[Korea]

Address: 8-8, Munpyeongseo-ro, Daedeok-gu, Daejeon

Phone: 82-42-9327939

Contact name: Yong-hwan Na

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Product Details

Quick Information

Place of Origin: Korea
Model Number : Alpis-3

Description

Features

Alpis-3 is a proprietary aluminum precursor that can be used for the CVD Al nucleation layer and can be used for the Al2O3 and AlN thin film by the ALD process at low temperature 100~200°C.

That is the most stable CVD Al precursor of the known and commercialized precursors.

Alpis-3 has been commercialized by DNF Co., Ltd and is currently used for aluminum plug of DRAM and Flash memory.

Specifications

Assay : Not less than 99.9999% (metal base)

Applications

CVD Al Precursor of DRAM and Flash Memory
ALD Precursor for the Al2O3
MOPVE and CBE Precursor for AlAs and AlGaAs

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